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Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 357-362

Thermally stable alkylsulfonium salts for ArF excimer laser resists

(4) Nakano, Kaichiro a Iwasa, Shigeyuki a Maeda, Katsumi a Hasegawa, Etsuo a

a NEC CORPORATION (Japan)

Author keywords

Alkylsulfonium salt; ArF excimer laser lithography; Chemically amplified resist; Photoacid generator

Indexed keywords

ACID; ALKYL GROUP; METHACRYLIC ACID; POLYMER; SULFONIUM DERIVATIVE; TRIFLUOROMETHANESULFONIC ACID;

ARTICLE; DECOMPOSITION; EXCIMER LASER; FILM; GENERATOR; RADIATION DOSE; SEMICONDUCTOR; THERMOSTABILITY;

EID: 0035754864 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.357 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.