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Journal of Photopolymer Science and Technology

Volumn 14, Issue 2, 2001, Pages 197-202

Laser ablation of transparent materials by UV fs-laser irradiation

(2) Niino, Hiroyuki a Yabe, Akira a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Surface microstructuring; Transparent materials; UV fs laser ablation

Indexed keywords

SILICON DIOXIDE;

ARTICLE; CATHETER ABLATION; DIFFUSION; LASER; MATERIAL STATE; MICROSCOPY; PHOTON; RADIATION ABSORPTION; SPECTRAL SENSITIVITY; THERMAL ANALYSIS; ULTRAVIOLET IRRADIATION;

EID: 0035754459 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.197 Document Type: Article

Times cited : (8)

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