Material and process development for KrF lithography using tri-level resist process

Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 469-474

  Sho, Koutaro ^a   Shiobara, Eishi ^a   Shibata, Tsuyoshi ^a   Nakagawa, Seiji ^a   Kajiwara, Seiji ^a   Matsushita, Takaya ^a   Urayama, Kazuhiko ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

KrF resist process; Pattern transfer process; SOG; Tri level resist process

Indexed keywords

FLUORIDE; KRYPTON; NITROGEN; SILICON;

ARTICLE; CROSS LINKING; LITHOGRAPHY; MATERIAL STATE; MOLECULAR STABILITY; REACTION ANALYSIS; TECHNOLOGY; THICKNESS;

EID: 0035751536     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.469     Document Type: Article

References (2)