SCOPUS 정보 검색 플랫폼

Volumn 14, Issue 3, 2001, Pages 341-344

Photobleaching photoacid generator

Author keywords

ArF excimer laser lithography; Cyclopropyldiphenyl sulfonium trifluoromethane sulfonate; Photoacid generator; Photobleaching

Indexed keywords

ACID; CYCLOPROPANE DERIVATIVE; SULFONIUM DERIVATIVE; TRIFLUOROMETHANESULFONIC ACID;

ARTICLE; BLEACHING; GENERATOR; LIGHT EXPOSURE; SYNTHESIS; THERMOSTABILITY; ULTRAVIOLET SPECTROSCOPY;

EID: 0035747315 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.341 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.