Microstructural and optical properties of LPCVD polysilicon films

Proceedings of the International Semiconductor Conference, CAS

Volumn 2, Issue , 2001, Pages 387-390

  Modreanu, M ^a   Gartner, Mariuca ^a   Tomozeiu, N ^a   Cobianu, C ^a   Cosmin, P ^a   Gavrila, Raluca ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; ELLIPSOMETRY; MATHEMATICAL MODELS; OPTICAL PROPERTIES; PRESSURE; SILICON; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; POLYSILICON THIN FILMS; SPECTROELIPSOMETRY;

POLYSILICON;

EID: 0035743842     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)