A silicon-etched probe for 3-D coordinate measurements with an uncertainty below 0.1 μm

IEEE Transactions on Instrumentation and Measurement

Volumn 50, Issue 6, 2001, Pages 1519-1523

  Haitjema, Han ^a   Pril, Wouter ^a   Schellekens, P H J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

CMM probe; Coordinate metrology; MEMS

Indexed keywords

COORDINATE MEASURING MACHINES; ETCHING; MICROELECTROMECHANICAL DEVICES; SEMICONDUCTING SILICON; STRAIN GAGES; THREE DIMENSIONAL; UNCERTAIN SYSTEMS;

DETECTION SYSTEM; FLEXURE HINGES; LASER DIODE GRATING UNIT; MICROTECHNOLOGY;

PROBES;

EID: 0035722536     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/19.982938     Document Type: Article

References (4)

1. Current status in and future trends of ultraprecision machining and ultra fine materials processing
2. Design for precision: Current status and trends
3. Optical profilometry and its application to mechanically inaccessible surfaces-Part I: Principles of focus error detection