NiO layers on Ni RABiTS for epitaxial buffer deposition by LS MOCVD

Journal De Physique. IV : JP

Volumn 11, Issue 11, 2001, Pages

  Selbmann, D ^a   Eickemeyer, J ^a   Wendrock, H ^a   Jimenez, C ^a   Donet, S ^a   Weiss, F ^a   Miller, U ^a   Stadel, O ^a  

^a LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTAL STRUCTURE; EPITAXIAL GROWTH; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; MULTILAYERS; NICKEL; NICKEL COMPOUNDS; OXIDATION; SUBSTRATES; SUPERCONDUCTING FILMS; YTTRIUM BARIUM COPPER OXIDES;

BIAXIALLY ORIENTED NICKEL OXIDE LAYER; CRITICAL TEMPERATURE; EPITAXIAL BUFFER DEPOSITION; LIQUID SOURCES METALLORGANIC CHEMICAL VAPOR DEPOSITION; NICKEL OXIDE LAYER; OXIDE BUFFER LAYER;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0035710161     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:20011139     Document Type: Conference Paper

References (11)