Applying a gas mixture containing c-C4F8 as an insulation medium

IEEE Transactions on Dielectrics and Electrical Insulation

Volumn 8, Issue 6, 2001, Pages 1075-1081

  Yamamoto, O ^a   Takuma, T ^a   Hamada, S ^a   Yamakawa, Y ^a   Yashima, M ^b  

^a KYOTO UNIVERSITY   (Japan)

^b CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; FLUOROCARBONS; GASES; GLOBAL WARMING; OZONE; TOXICITY;

GAS INSULATED SYSTEM; OZONE DEPLETION POTENTIAL; PERFLUOROCYCLOBUTANE; RECYCLING LOSS; SULFUR HEXAFLUORIDE;

ELECTRIC INSULATING MATERIALS;

EID: 0035696223     PISSN: 10709878     EISSN: None     Source Type: Journal    
DOI: 10.1109/94.971467     Document Type: Article

References (13)

1. 6
2. A search for possible "Universal Application gas mixture"
3. 6 gas in power industry
4. 8 in gas insulation
5. 6
6. Properties of octafluorocyclobutane, a. dielectric gas
7. Dielectric strength of new gases and gas mixtures
8. 8
9. 2 in compressed gas-insulated equipment
10. 6
11. Breakdown characteristics of compressed gas mixtures in nearly uniform fields