Diffusion of 195Au in amorphous Si3N4 and Si4N3

Physica B: Condensed Matter

Volumn 308-310, Issue , 2001, Pages 431-433

  Voss, T ^a   Matics, S ^a   Strohm, A ^b   Frank, W ^a,b   Bilger, G ^a,c  

^a UNIVERSITY OF STUTTGART   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c CERN   (Switzerland)

Author keywords

195Au diffusion in amorphous Si3N4 and Si4N3; Interstitial type diffusion mechanisms; Order disorder phase transtition; Radiotracer technique

Indexed keywords

ANNEALING; CHEMICAL RELAXATION; DIFFUSION IN SOLIDS; FREEZING; GOLD; PHASE TRANSITIONS; SILICON NITRIDE;

STRUCTURAL RELAXATION;

AMORPHOUS SILICON;

EID: 0035679619     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(01)00777-3     Document Type: Article

References (6)