Hall effect and surface characterization of Cu2S and CuS films deposited by RF reactive sputtering

Physica B: Condensed Matter

Volumn 308-310, Issue , 2001, Pages 1069-1073

  He, Y B ^a   Polity, A ^a   Osterreicher I ^a   Pfisterer, D ^a   Gregor, R ^a   Meyer, B K ^a   Hardt, M ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

Author keywords

CuxS; Hall effect measurement; RF sputtering; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER COMPOUNDS; HALL EFFECT; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; SURFACES; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

RADIO FREQUENCY (RF) REACTIVE SPUTTERING; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 0035676086     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(01)00851-1     Document Type: Article

References (8)