Distributed MEMS phase shifters by microstereolithography on silicon substrates for microwave and millimeter wave applications

Smart Materials and Structures

Volumn 10, Issue 6, 2001, Pages 1224-1229

  Ji, T S ^a   Vinoy, K J ^a   Varadan, V K ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC IMPEDANCE; LITHOGRAPHY; MICROWAVES; MILLIMETER WAVES; PHASE SHIFTERS; SEMICONDUCTING SILICON; SPACE APPLICATIONS; SUBSTRATES; WAVEGUIDES;

MICROSTEREOLITHOGRAPHY;

MICROELECTROMECHANICAL DEVICES;

EID: 0035672653     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/10/6/311     Document Type: Article

References (9)

1. Micromechanical membrane switches for microwave applications
2. RF-MEMS switches for reconfigurable integrated circuits
3. Distributed MEMS true-time delay phase shifter and wide-band switches
4. Low-loss distributed MEMS phase shifter
5. Combining microstereolithography and thick resist UV lithography for 3D microfabrication
6. 2-bit MEMS distributed x-band phase shifters
7. Self-consistent simulation and modeling of electrostatically deformed diaphragms