Effects of film type and wafer shape on oxide CMP characteristics

Journal of the Korean Physical Society

Volumn 39, Issue SUPPL. Part 1, 2001, Pages

  Park, J G ^a   Jung, H I ^a   Katoh, T ^a   Paik, U G ^a   Jeon, H ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035649178     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

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