Synthesis of new photoresponsive polymers containing trifluoromethyl-substituted norbornadiene moieties

Chemistry Letters

Volumn , Issue 12, 2001, Pages 1308-1309

  Nagai, Takabumi ^b   Shimada, Miwa ^b   Nishikubo, Tadatomi ^a  

^a KANAGAWA UNIVERSITY   (Japan)

^b Daikin Environmental Laboratory Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035648064     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2001.1308     Document Type: Article

References (19)

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13. The structure of the new compounds was confirmed by MS, IR, and NMR spectra.
14. 1H-NMR spectrum.
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16. w were estimated by GPC based on Polystyrene standard.
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18. Preparation of polymer film: A solution of polymer (7.4 mg) in chloroform (1 mL) was degassed by three consecutive freeze-pump-thaw cycles and cast on a quartz plate. Then, the quartz plate-cast polymer was dried in vacuo at 80 °C for 15 h. Furthermore, a solution of PMMA chloroform was cast on the film and dried in the same way as above. Examination of the durability: The experiment was performed under argon atmosphere. Initially, the polymer film was irradiated by a 500-W xenon lamp (Ushio Electric Co., UI-502Q) until the disappearance of the absorbance of the absorption maxima. Then, the film containing the corresponding QC moieties was heated on a hot plate until the reversion of the absorbance of the NBD moieties (irradiated for 2 min, then heated at 80 °C for 20 min).
19. max of the NBD moieties on the 1st and nth cycles of reactions, respectively.