Nonlinear thermal-distortion predictions of a silicon monochromator using the finite element method

Journal of Synchrotron Radiation

Volumn 8, Issue 5, 2001, Pages 1140-1148

  Tajiri, Gordon ^a   Lee, Wah Keat ^a   Fernandez, Patricia ^a   Mills, Dennis ^a   Assoufid, Lahsen ^a   Amirouche, Farid ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b University of Illinois at Chicago   (United States)

Author keywords

Finite element method; Nonlinear thermal distortions; Silicon monochromators

Indexed keywords

EID: 0035615588     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049501012006     Document Type: Article

References (12)

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