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Volumn 627, Issue 4, 2001, Pages 655-661

Trifluoromethyl Nitrate, CF3ONO2;Trifluormethylnitrat, CF3ONO2

Author keywords

Gas electron diffraction; Trifluoromethyl nitrate

Indexed keywords


EID: 0035588391     PISSN: 00442313     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3749(200104)627:4<655::AID-ZAAC655>3.0.CO;2-P     Document Type: Article
Times cited : (12)

References (32)
  • 3
    • 85050435909 scopus 로고
    • D. C. Neckers, D. H. Volman, G. von Bünau (Hrsg.) John Wiley & Sons: New York
    • J. S. Francisco, M. M. Maricq: Advances in Photochemistry, D. C. Neckers, D. H. Volman, G. von Bünau (Hrsg.) John Wiley & Sons: New York 1995, Vol. 20, pp 79-163.
    • (1995) Advances in Photochemistry , vol.20 , pp. 79-163
    • Francisco, J.S.1    Maricq, M.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.