Dramatic reduction of DC field emission from large area electrodes by plasma-source ion implantation

Proceedings of the IEEE Particle Accelerator Conference

Volumn 1, Issue , 2001, Pages 610-612

  Sinclair, C K ^a   Dylla, H F ^a   Siggins, T L ^a   Manos, D ^a   Wu, L ^a   Venhaus, T J ^a  

^a THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRON GUNS; ELECTRON SOURCES; FIELD EMISSION CATHODES; ION IMPLANTATION; PHOTOCATHODES; PLASMA SOURCES; SUPERCONDUCTING MATERIALS;

SUPERCONDUCTING LINEAR ACCELERATORS;

PARTICLE ACCELERATORS;

EID: 0035570920     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)