Nanoindention studies of DC sputtered Cu and Cu/Cr thin films

Materials Research Society Symposium - Proceedings

Volumn 672, Issue , 2001, Pages

  Wei, G ^a   Du, J ^a   Rar, A ^a   Barnard, J A ^a  

^a University of Alabama   (United States)

Author keywords

Grain Size; Hall Petch; Nanoindention; Transmission Electron Microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; COPPER; GRAIN SIZE AND SHAPE; INDENTATION; MAGNETRON SPUTTERING; MORPHOLOGY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HALL-PETCH; HYSITRON NANOMECHANICAL SYSTEM; NANOINDENTATION; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 0035558992     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-672-o5.7     Document Type: Conference Paper

References (26)