Investigation on the thermal and electrical properties of Ti-Si-O film formed by the composite sputtering deposition

Materials Research Society Symposium - Proceedings

Volumn 670, Issue , 2001, Pages

  Nishiyama, Akira ^a   Kaneko, Akio ^a   Koyama, Masato ^a   Kamata, Yoshiki ^a   Fujiwara, Ikuo ^a   Koike, Masahiro ^a   Yoshiki, Masahiko ^a   Koike, Mitsuo ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN SIZE AND SHAPE; LEAKAGE CURRENTS; PERMITTIVITY; PHASE SEPARATION; RAPID THERMAL ANNEALING; SILICA; SPUTTER DEPOSITION; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

THERMAL GROOVING;

NANOSTRUCTURED MATERIALS;

EID: 0035557146     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-670-k4.8     Document Type: Conference Paper

References (13)