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Advanced Metallization Conference (AMC)

Volumn , Issue , 2001, Pages 427-432

Electromigration reliability of Cu/spin-on porous ultra low-k interconnects

(2) Mosig, Karsten a Blaschke, Volker a

a INFINEON TECHNOLOGIES AG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COPPER; CURRENT DENSITY; ELECTROMIGRATION; METALLIZING; PERMITTIVITY; POROSITY; POROUS MATERIALS; SILICA;

JOULE HEATING;

DIELECTRIC MATERIALS;

EID: 0035555210 PISSN: 10480854 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (8)

References (10)

1
- 0004245602
- 2000 update, Semiconductor Industry Association, San Jose, CA
- (2000) The International Technology Roadmap for Semiconductors

2
- 0041691707
- October
- (1997) MRS Bulletin , pp. 61-69
- List, R.S.¹ Singh, A.² Ralston, A.³ Dixit, G.⁴

3
- 0002465020
- IEEE, Piscataway, NJ
- (2001) Proc. International Interconnect Technology Conference 2001 , pp. 292-294
- Mosig, K.¹ Jacobs, T.² Kofron, P.³ Daniels, M.⁴ Brennan, K.⁵ Gonzales, A.⁶ Augur, R.⁷ Wetzel, J.⁸ Havemann, R.⁹ Shiota, A.¹⁰

4
- 0002576616
- IEEE, Piscataway, NJ
- (2001) Proc. International Interconnect Technology Conference 2001 , pp. 295-297
- Hiroi, M.¹ Tada, M.² Ohtake, H.³ Saito, S.⁴ Onodera, T.⁵ Furutake, N.⁶ Harada, Y.⁷ Hayashi, Y.⁸

5
- 26444590207
- IEEE, Piscataway, NJ
- (2001) Proc. International Interconnect Technology Conference 2001 , pp. 266-268
- Tsai, M.H.¹ Augur, R.² Blaschke, V.³ Havemann, R.H.⁴ Ogawa, E.T.⁵ Ho, P.S.⁶ Yeh, W.K.⁷ Shue, S.L.⁸ Yu, C.H.⁹ Liang, M.S.¹⁰

6
- 0033750362
- April 2000, San Jose, CA (IEEE, Piscataway, NJ)
- (2000) IEEE International Reliability Physics Symposium , pp. 354-358
- Banerjee, K.¹ Mehrotra, A.² Hunter, W.³ Saraswat, K.C.⁴ Goodson, K.E.⁵ Wong, S.S.⁶

7
- 0032157502
- (1998) IEEE Trans. on Components, Packaging and Manufacturing Technology-Part A , vol.21 , Issue.3 , pp. 1
- Rzepta, S.¹ Banerjee, K.² Meusel, E.³ Hu, C.⁴

8
- 0005547322
- San Diego, CA, in press
- (2000) Proc. Advanced Metallization Conference 2000
- Ogawa, E.T.¹ Bierwag, A.J.² Lee, K.D.³ Matsuhashi, H.⁴ Justison, P.R.⁵ Ramamurthi, A.N.⁶ Ho, P.S.⁷ Blaschke, V.⁸ Griffiths, D.⁹ Nelsen, A.¹⁰ Green, M.¹¹ Havemann, R.H.¹²

9
- 0025435021
- (1990) IEEE Trans. Electron Devices , vol.37 , pp. 1343
- Liew, B.K.¹ Cheung, N.W.² Hu, C.³

10
- 0032124054
- (1998) Journal of Materials Research , vol.13 , pp. 1956
- Gouldstone, A.¹ Shen, Y.L.² Suresh, S.³ Thompson, C.V.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.