H2S and NH3 removal by silent discharge plasma and ozone combo-system

Plasma Chemistry and Plasma Processing

Volumn 21, Issue 4, 2001, Pages 611-624

  Ma, Hongbin ^a   Chen, Paul ^a   Ruan, Roger ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

H2S; NH3; Ozone; Silent discharge plasma

Indexed keywords

EID: 0035541878     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012055203010     Document Type: Article

References (24)

1. J. Zhu and L. D. Jacobson, J. Environ. Qual. 28, 737 (1999).
2. H. M. ApSimon, M. Kruse, and J. N. B. Bell, Atmos. Environ. 21, 1939 (1987).
3. C. L. Barth, L. F. Elliott, and S. W. Melvin, Trans. ASAE 21, 859 (1984).
4. A. Mizuno, J. S. Clement, and R. H. Davis, IEEE Trans. Indust. Applic. 22, 516 (1986).
5. J. S. Clements, A. Mizuno, and W. C. Finney, IEEE Trans. Indust. Applic. 25, 62 (1989).
6. M. A. Ahimizak, A. Mizuno, K. Shimizu, A. Chakrabarti, L. Dasalescu, and S. Furuta, IEEE Trans. Indust. Applicat. 31, 957 (1995).
7. E. M. Van Veldhuizen, L. M. Zhou, and W. R. Rutgers, Plasma Chem. Plasma Process. 18, 91 (1998).
8. K. Yan, S. Kanazawa, T. Ohkuvo, and Y. Nomoto, Plasma Chem. Plasma Process. 19, 421 (1996).
9. Y. S. Mok, S. W. Han, and I. S. Nam, Plasma Chem. Plasma Process. 18, 535 (1998).
10. E. M. Van Veldhuizen, W. R. Rutgers, and V. A. Bityurin, Plasma Chem. Plasma Process. 16, 227 (1996).
11. E. Sani, F. Mattachini, K. Yan, G. Gabetta, I. Gakkubnbertu, M. Rea, U. Tromboni, J. Leonhardt, R. Rudolf, E. Marode, and P. Segur, in Proc. 11th Intern. Conf. Gas Discharge and their Application, Tokyo (1995).
12. G. K. Anderson, H. Snyder, and J. Coogan, Plasma Chem. Plasma Process. 19, 131 (1999).
13. H. D. Gesser, N. R. Hunter, and D. Probowono, Plasma Chem. Plasma Process. 18, 241 (1998).
14. M. A. Malil and X. Z. Jiang, Plasma Chem. Plasma Process. 19, 505 (1999).
15. L. M. Zhou, B. Xue, U. Kogelschatz, and B. Eliasson, Plasma Chem. Plasma Process. 18, 375-393 (1998).
16. J. J. Coogan and A. S. Jassal, Silent Discharge Plasma (SDP) for Point-of-Use (POU) Abatement of Volatile Organic Compounds (VOC) Emissions: Final Report (ESHCoo3). SEMATECH. Inc. (1997).
17. B. Eliason, U. Kogelschatz, and P. Baessler, J. Phys. B: Atom. Md. Phys. 17, 797 (1984).
18. D. Jhelfrich, IEEE. Trans. Indust. Applic. 29, 882 (1993).
19. G. Dimelli, L. Civitano, and M. Rea, in IEEE IAS Annual Meeting, (1988), pp. 1620-1627.
20. L. A. Rosocha, "Processing of hazardous chemicals using silent-electrical-discharge plasma," in Plasma Science and the Environment (W. Manheimer, L. E. Sugiyama, and T. H. Stix, eds.), AIP Press, New York (1997), Chap. 11, pp. 261-298.
21. J. S. Chang, P. A. Lawless, and T. Yamamoto, IEEE Trans. Plasma Sci. 19, 1152 (1991).
22. R. Zhang, T. Yamamoto, and D. S. Bundy, IEEE Trans. Indust.Applicat. 32, 113 (1996).
23. R. Ruan, W. Han, A. Ning, P. E. Chen, and P. R. Goodrich, ASAE Paper No. 974038, St. Joseph, MI (1997).
24. B. Eliasson and U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 309 (1991).