Effect of photopolymerization on the rate of photocrosslink in chalcone-based oligomeric compounds

Bulletin of the Korean Chemical Society

Volumn 22, Issue 11, 2001, Pages 1207-1212

  Choi, Dong Hoon ^a   Oh, Sang Joon ^a   Ban, Si Young ^a   Oh, Kwang Yong ^a  

^a Kyung Hee University   (South Korea)

Author keywords

Chalcone dimethacrylate; Chalcone epoxy; Photocrosslink; Photopolymerization; Photosensitivity

Indexed keywords

CHALCONE; EPOXIDE; METHACRYLIC ACID; OLIGOMER;

ARTICLE; CORRELATION ANALYSIS; CROSS LINKING; FOURIER ANALYSIS; LIGHT ABSORPTION; PHOTOCHEMISTRY; PHOTOREACTIVITY; POLYMERIZATION; RADIATION EXPOSURE; SYNTHESIS; ULTRAVIOLET RADIATION;

EID: 0035540614     PISSN: 02532964     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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