A proposed process control chart for DC plasma spraying process. Part II. Experimental verification for spraying alumina

Plasma Chemistry and Plasma Processing

Volumn 21, Issue 3, 2001, Pages 401-420

  Ang, C B ^a   Devasenapathi, A ^a   Ng, H W ^a   Yu, S C M ^a   Lam, Y C ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Alumina; Computational fluid dynamics (cfd); Deposition efficiency; Injection velocity; Plasma spraying

Indexed keywords

EID: 0035536206     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1011026526843     Document Type: Article

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