Preparation of highly ordered nanoporous Co membranes assembled by small quantum-sized Co particles

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 4, 2001, Pages 1109-1114

  Lei, Y ^a   Liang, C H ^a   Wu, Y C ^a   Zhang, L D ^a   Mao, Y Q ^b  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b NANJING INSTITUTE OF GEOLOGY AND PALAEONTOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ASPECT RATIO; ASSEMBLY; DENSITY (SPECIFIC GRAVITY); ELECTRON DIFFRACTION; HONEYCOMB STRUCTURES; MEMBRANES; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; QUANTUM THEORY; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

NANOPOROUS COBALT MEMBRANES; POROUS ANODIC ALUMINA; QUANTUM SIZED COBALT PARTICLES; REPLICATION PROCESS;

COBALT;

EID: 0035535251     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1378011     Document Type: Conference Paper

References (22)

1. G. O. Mallory and J. B. Hadju, Electroless Plating: Fundamentals and Applications (American Electroplates and Surface Finishing Society, Orlando, FL, 1990).
2. T. Osaka, T. Homma, N. Masubuchi, K. Saito, M. Yoshino, Y. Yamazaki, and T. Namikawa, J. Magn. Soc. Jpn. 14, 309 (1990).
3. T. Osaka, T. Homma, K. Saito, A. Tokekoshi, Y. Yamazaki, and T. Namikawa, J. Electrochem. Soc. 139, 1311 (1992).
4. A. P. Valanju, I. S. Jeong, D. Y. Kim, and R. M. Walser, J. Appl. Phys. 64, 5443 (1988).
5. M. Mirzamaani, L. Romankiw, C. McGrath, and J. Karasinski, J. Electrochem. Soc. 135, 2813 (1988).
6. T. Homma, Y. Kita, and T. Osaka, J. Electrochem. Soc. 147, 160 (2000).
7. F. Keller, M. S. Hunter, and D. L. Robinson, J. Electrochem. Soc. 100, 411 (1953).
8. C. R. Martin, Science 266, 1961 (1994).
9. C. A. Huber, T. E. Huber, M. Sadoqi, J. A. Lubin, S. Manolis, and C. B. Prater, Science 263, 800 (1994).
10. S. A. Sapp, B. B. Lakshmi, and C. R. Martin, Adv. Mater. 11, 402 (1999).
11. P. Hoyer, Adv. Mater. 8, 857 (1996).
12. J. Li, C. Papadopoulos, and J. M. Xu, Appl. Phys. Lett. 75, 367 (1999).
13. H. Masuda and M. Satoh, Jpn. J. Appl. Phys., Part 1 35, 126 (1996).
14. H. Masuda, F. Hasegwa, and S. Ono, J. Electrochem. Soc. 144, L127 (1997).
15. H. Masuda, H. Tanaka, and N. Baba, Chem. Phys. Lett. 1990, 621 (1990);
16. H. Masuda, K. Nishio, and N. Baba, Thin Solid Films 223, 1 (1993);
17. H. Masuda, T. Mizuno, N. Baba, and T. Ohmori, J. Electroanal. Chem. 368, 333 (1994).
18. H. Masuda, and K. Fukuda, Science 268, 1466 (1995).
19. H. Masuda, K. Nishio, and N. Baba, Jpn. J. Appl. Phys., Part 2 31, L1775 (1992);
20. P. Hoyer, N. Baba, and H. Masuda, Appl. Phys. Lett. 66, 2700 (1995);
21. P. Hoyer and H. Masuda, J. Mater. Sci. Lett. 15, 1228 (1996).
22. A. P. Li, F. Muller, A. Birner, K. Nielsch, and U. Gösele, J. Vac. Sci. Technol. A 17, 1 (1999).