Improvement of catalyst durability in benzene photooxidation by rhodium deposition on TiO2

Chemistry Letters

Volumn , Issue 6, 2001, Pages 582-583

  Einaga, Hisahiro ^a   Futamura, Shigeru ^a   Ibusuki, Takashi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035533958     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2001.582     Document Type: Article

References (9)

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9. 2 at the (001) surface, 5.18 at (101), 3.93 at (110), 2.79 at (100), and 1.90 at (111); K. S. Kim, M. A. Barteau, and W. E. Farneth, Langmuir 4, 533 (1988).