Anomalous behavior of arsenic ions implanted into silicon at 85o°C

Technical Physics

Volumn 46, Issue 4, 2001, Pages 490-491

  Demakov, K D ^a   Starostin, V A ^a  

^a KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035531396     PISSN: 10637842     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1365477     Document Type: Article

References (5)

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5. T. Ahlgren, E. Vainonen, J. Likonen, and J. Keinonen, Phys. Rev. B 57 (16), 9723 (1998).