Hydrogen generation from water with nonthermal plasma

Chemistry Letters

Volumn , Issue 12, 2001, Pages 1314-1315

  Kabashima, Hajime ^a   Einaga, Hisahiro ^a   Futamura, Shigeru ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035528554     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2001.1314     Document Type: Article

References (10)

1. T. Takata, A. Tanaka, M. Hara, J. N. Kondo, and K. Domen, Catal. Today, 44, 17 (1998).
2. T. Ohta, Appl. Energy, 67, 181 (2000).
3. S. Tanabe, H. Matsuguma, K. Okitsu, and H. Matsumoto, Chem. Lett., 2000, 1116.
4. X. Chen, M. Marquez, J. Rozak, C. Marun, J. Luo, S. L. Suib, Y. Hayashi, and H. Matsumoto, J. Catal., 178, 372 (1998).
5. S. Futamura, A. Zhang, and T. Yamamoto, IEEE Trans. Ind. Applicat., 36(6), 1507 (2000).
6. H. Einaga, T. Ibusuki, and S. Futamura, 35th IEEE-IAS Annual Meeting, Rome, October 2000; Abstr., No. MSDAD-S01-15; H. Einaga, T. Ibusuki, and S. Futamura, IEEE Trans. Ind. Applicat., 37(5), 1476 (2001).
7. H. Einaga, T. Ibusuki, and S. Futamura, 35th IEEE-IAS Annual Meeting, Rome, October 2000; Abstr., No. MSDAD-S01-15; H. Einaga, T. Ibusuki, and S. Futamura, IEEE Trans. Ind. Applicat., 37(5), 1476 (2001).
8. S. Futamura, A. Zhang, and T. Yamamoto, J. Electrostatics, 42, 51 (1997).
9. S. Futamura, A. Zhang, and H. Einaga, IEEE Trans. Ind. Applicat., 37(4), 978 (2001).
10. J. S. Chang, Proc., Plasma Science Symposium 2000/18th Symposium on Plasma Processing, Kyoto, January 2001; Abstr., No. P3-88.