-
1
-
-
84979184865
-
Oxidation Behavior of Silicon Carbide
-
G. Ervin, "Oxidation Behavior of Silicon Carbide," J. Am. Ceram. Soc., 41 [9] 347-52 (1958).
-
(1958)
J. Am. Ceram. Soc.
, vol.41
, Issue.9
, pp. 347-352
-
-
Ervin, G.1
-
2
-
-
84979189834
-
Oxidation of Silicon Carbide
-
P. J. Jorgenson, M. E. Wadsworth, and I. B. Cutler, "Oxidation of Silicon Carbide," J. Am. Ceram. Soc., 42 [12] 613-16 (1959).
-
(1959)
J. Am. Ceram. Soc.
, vol.42
, Issue.12
, pp. 613-616
-
-
Jorgenson, P.J.1
Wadsworth, M.E.2
Cutler, I.B.3
-
3
-
-
0013306680
-
The Oxidation of SiC
-
K. Motzfeldt, "The Oxidation of SiC," Acta Chem. Scand., 18 [7] 1596-606 (1964).
-
(1964)
Acta Chem. Scand.
, vol.18
, Issue.7
, pp. 1596-1606
-
-
Motzfeldt, K.1
-
4
-
-
0027282886
-
Corrosion of Silicon-Based Ceramics in Combustion Environments
-
N. S. Jacobson, "Corrosion of Silicon-Based Ceramics in Combustion Environments," J. Am. Ceram. Soc., 76 [1] 3-28 (1993).
-
(1993)
J. Am. Ceram. Soc.
, vol.76
, Issue.1
, pp. 3-28
-
-
Jacobson, N.S.1
-
5
-
-
84987344259
-
Oxidation Kinetics of Silicon Carbide Crystals and Ceramics: I, in Dry Oxygen
-
J. A. Costello and R. E. Tressler, "Oxidation Kinetics of Silicon Carbide Crystals and Ceramics: I, In Dry Oxygen," J. Am. Ceram. Soc., 69 [9] 674-81 (1986).
-
(1986)
J. Am. Ceram. Soc.
, vol.69
, Issue.9
, pp. 674-681
-
-
Costello, J.A.1
Tressler, R.E.2
-
6
-
-
0016428180
-
Oxidation of 6H-a Silicon Carbide Platelets
-
R. C. A. Harris, "Oxidation of 6H-a Silicon Carbide Platelets," J. Am. Ceram. Soc., 58 [1-2] 7-9 (1975).
-
(1975)
J. Am. Ceram. Soc.
, vol.58
, Issue.1-2
, pp. 7-9
-
-
Harris, R.C.A.1
-
7
-
-
0030283432
-
Passive-Oxidation Kinetics of High-Purity Silicon Carbide from 800° to 1100°C
-
C. E. Ramberg, G. Cruciani, K. E. Spear, R. E. Tressler, and C. F. Ramberg Jr., "Passive-Oxidation Kinetics of High-Purity Silicon Carbide from 800° to 1100°C," J. Am. Ceram. Soc., 79 [11] 2897-11 (1996).
-
(1996)
J. Am. Ceram. Soc.
, vol.79
, Issue.11
, pp. 2897-2911
-
-
Ramberg, C.E.1
Cruciani, G.2
Spear, K.E.3
Tressler, R.E.4
Ramberg C.F., Jr.5
-
8
-
-
0026102267
-
Oxygen Tracer Diffusion in Vitreous Silica
-
J. D. Kalen, R. S. Boyce, and J. D. Cawley, "Oxygen Tracer Diffusion in Vitreous Silica," J. Am. Ceram. Soc., 74 [1] 203-209 (1991).
-
(1991)
J. Am. Ceram. Soc.
, vol.74
, Issue.1
, pp. 203-209
-
-
Kalen, J.D.1
Boyce, R.S.2
Cawley, J.D.3
-
9
-
-
0026961976
-
Oxygen Mobility in Silicon Dioxide and Silicate Glasses: A Review
-
M. A. Lamkin, F. L. Riley, and R. J. Fordham, "Oxygen Mobility in Silicon Dioxide and Silicate Glasses: A Review," J. Eur. Ceram. Soc., 10, 347-67 (1992).
-
(1992)
J. Eur. Ceram. Soc.
, vol.10
, pp. 347-367
-
-
Lamkin, M.A.1
Riley, F.L.2
Fordham, R.J.3
-
10
-
-
0001652254
-
Permeation of Gaseous Oxygen Through Vitreous Silica
-
F. J. Norton, "Permeation of Gaseous Oxygen Through Vitreous Silica," Nature (London), 191 [4789] 701 (1961).
-
(1961)
Nature (London)
, vol.191
, Issue.4789
, pp. 701
-
-
Norton, F.J.1
-
11
-
-
84978555191
-
Diffusion in Vitreous Silica
-
E. W. Sucov, "Diffusion in Vitreous Silica," J. Am. Ceram.'cram. Soc., 46 [1] 14-20 (1963).
-
(1963)
J. Am. Ceram.'cram. Soc.
, vol.46
, Issue.1
, pp. 14-20
-
-
Sucov, E.W.1
-
13
-
-
0000074574
-
Oxygen Diffusion in Vitreous Silica -Utilization of Natural Abundances
-
K. Muehlenbachs and H. A. Schaeffer, "Oxygen Diffusion in Vitreous Silica -Utilization of Natural Abundances," Can. Miner., 15, 179-84 (1977).
-
(1977)
Can. Miner.
, vol.15
, pp. 179-184
-
-
Muehlenbachs, K.1
Schaeffer, H.A.2
-
14
-
-
84977251912
-
Diffusion of Oxygen in Fused Silica
-
E. L. Williams, "Diffusion of Oxygen in Fused Silica," J. Am. Ceram. Soc., 48 [4] 190-94 (1965).
-
(1965)
J. Am. Ceram. Soc.
, vol.48
, Issue.4
, pp. 190-194
-
-
Williams, E.L.1
-
15
-
-
0021481862
-
Isotope Labeling Studies of the Oxidation of Silicon at 1000° and 1300°C
-
J. A. Costello and R. E. Tressler, "Isotope Labeling Studies of the Oxidation of Silicon at 1000° and 1300°C," J. Electrochem. Soc., 131 [8] 1944-47 (1984).
-
(1984)
J. Electrochem. Soc.
, vol.131
, Issue.8
, pp. 1944-1947
-
-
Costello, J.A.1
Tressler, R.E.2
-
16
-
-
0023401674
-
Oxygen-18 Tracer Study of the Passive Thermal Oxidation of Silicon
-
J. D. Cawley, J. W. Halloran, and A. R. Cooper, "Oxygen-18 Tracer Study of the Passive Thermal Oxidation of Silicon," Oxid. Met., 28 [1/2] 1-16 (1987).
-
(1987)
Oxid. Met.
, vol.28
, Issue.1-2
, pp. 1-16
-
-
Cawley, J.D.1
Halloran, J.W.2
Cooper, A.R.3
-
17
-
-
1642621158
-
General Relationship for the Thermal Oxidation of Silicon
-
B. E. Deal and A. S. Grove, "General Relationship for the Thermal Oxidation of Silicon," J. Appl. Phys., 36 [12] 3770-78 (1965).
-
(1965)
J. Appl. Phys.
, vol.36
, Issue.12
, pp. 3770-3778
-
-
Deal, B.E.1
Grove, A.S.2
-
18
-
-
85047669212
-
Development of Oxide Scale Microstructure on Single-Crystal SiC
-
L. U. J. T. Ogbuji, "Development of Oxide Scale Microstructure on Single-Crystal SiC," J. Mater. Sci., 16, 2753-59 (1981).
-
(1981)
J. Mater. Sci.
, vol.16
, pp. 2753-2759
-
-
Ogbuji, L.U.J.T.1
-
19
-
-
84978547356
-
Effects of Water Vapor on Oxidation of Silicon Carbide
-
P. J. Jorgenson, M. E. Wadsworth, and I. B. Cutler, "Effects of Water Vapor on Oxidation of Silicon Carbide," J. Am. Ceram, Soc., 44 [6] 258-61 (1961).
-
(1961)
J. Am. Ceram, Soc.
, vol.44
, Issue.6
, pp. 258-261
-
-
Jorgenson, P.J.1
Wadsworth, M.E.2
Cutler, I.B.3
-
20
-
-
0001081025
-
Kinetics of Thermal Growth of Silicon Dioxide Films in Water Vapor-Oxygen-Argon Mixtures
-
T. Nakayama and F. C. Collins, "Kinetics of Thermal Growth of Silicon Dioxide Films in Water Vapor-Oxygen-Argon Mixtures," J. Electrochem. Soc., 113 [7] 706-13 (1966).
-
(1966)
J. Electrochem. Soc.
, vol.113
, Issue.7
, pp. 706-713
-
-
Nakayama, T.1
Collins, F.C.2
-
21
-
-
0014477212
-
Kinetics and Mechanism of Thermal Oxidation of Silicon with Special Emphasis on Impurity Effects
-
A. G. Revesz and R. J. Evans, "Kinetics and Mechanism of Thermal Oxidation of Silicon with Special Emphasis on Impurity Effects," J. Chem. Phys. Solids, 30, 551-64 (1969).
-
(1969)
J. Chem. Phys. Solids
, vol.30
, pp. 551-564
-
-
Revesz, A.G.1
Evans, R.J.2
-
22
-
-
0016335365
-
The Effects of Trace Amounts of Water on the Thermal Oxidation of Silicon in Oxygen
-
E. A. Irene, "The Effects of Trace Amounts of Water on the Thermal Oxidation of Silicon in Oxygen," J. Electrochem. Soc., 121 [12] 1611-16 (1974).
-
(1974)
J. Electrochem. Soc.
, vol.121
, Issue.12
, pp. 1611-1616
-
-
Irene, E.A.1
-
23
-
-
0026849137
-
The Effect of Sodium Contamination on the Oxidation of Single-Crystal Silicon Carbide
-
Z. Zheng, R. E. Tressler, and K. E. Spear, "The Effect of Sodium Contamination on the Oxidation of Single-Crystal Silicon Carbide," Corros. Sci., 33 [4] 545-56 (1992).
-
(1992)
Corros. Sci.
, vol.33
, Issue.4
, pp. 545-556
-
-
Zheng, Z.1
Tressler, R.E.2
Spear, K.E.3
-
24
-
-
0003767280
-
2O
-
Edited by H. R. Huff and E. Sirth. Electrochemical Society, Pennington, NJ
-
2O"; pp. 313-23 in Semiconductor Silicon 1977. Edited by H. R. Huff and E. Sirth. Electrochemical Society, Pennington, NJ, 1977.
-
(1977)
Semiconductor Silicon 1977
, pp. 313-323
-
-
Irene, E.A.1
Ghez, R.2
-
26
-
-
4344659236
-
Oxidation of Chemically Vapor-Deposited Silicon Nitride and Single-Crystal Silicon
-
D. J. Choi, D. B. Fishbach, and W. D. Scott, "Oxidation of Chemically Vapor-Deposited Silicon Nitride and Single-Crystal Silicon," J. Am. Ceram. Soc., 72 [7] 1118-23 (1989).
-
(1989)
J. Am. Ceram. Soc.
, vol.72
, Issue.7
, pp. 1118-1123
-
-
Choi, D.J.1
Fishbach, D.B.2
Scott, W.D.3
-
27
-
-
0029291341
-
Influence of Alumina Reaction Tube Impurities on the Oxidation of Chemically Vapor-Deposited Silicon Carbide
-
E. J. Opila, "Influence of Alumina Reaction Tube Impurities on the Oxidation of Chemically Vapor-Deposited Silicon Carbide," J. Am. Ceram. Soc., 78 [4] 1107-10 (1995).
-
(1995)
J. Am. Ceram. Soc.
, vol.78
, Issue.4
, pp. 1107-1110
-
-
Opila, E.J.1
-
28
-
-
0014800514
-
Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology
-
W. Kern and D. A. Puotinen, "Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology," RCA Rev., 31, 187-206 (1970).
-
(1970)
RCA Rev.
, vol.31
, pp. 187-206
-
-
Kern, W.1
Puotinen, D.A.2
-
30
-
-
0031167886
-
Effect of Oxide Devitrification on Oxidation Kinetics of SiC
-
L. U. J. T. Ogbuji, "Effect of Oxide Devitrification on Oxidation Kinetics of SiC," J. Am. Ceram. Soc., 80 [6] 1544-50 (1997).
-
(1997)
J. Am. Ceram. Soc.
, vol.80
, Issue.6
, pp. 1544-1550
-
-
Ogbuji, L.U.J.T.1
-
31
-
-
0024716359
-
High-Temperature Passive Oxidation of Chemically Vapor-Deposited Silicon Carbide
-
T. Narushima, T. Goto, and T. Hirai, "High-Temperature Passive Oxidation of Chemically Vapor-Deposited Silicon Carbide," J. Am. Ceram. Soc., 72 [8] 1386-90 (1989).
-
(1989)
J. Am. Ceram. Soc.
, vol.72
, Issue.8
, pp. 1386-1390
-
-
Narushima, T.1
Goto, T.2
Hirai, T.3
-
33
-
-
0028272809
-
High-Temperature Oxidation of CVD β-SiC, Part I. Experimental Study
-
J. Rodriguez-Viejo, F. Sibieude, and M. T. Clavaguera-Mora, "High-Temperature Oxidation of CVD β-SiC, Part I. Experimental Study," J. Eur. Ceram. Soc., 13, 167-75 (1994).
-
(1994)
J. Eur. Ceram. Soc.
, vol.13
, pp. 167-175
-
-
Rodriguez-Viejo, J.1
Sibieude, F.2
Clavaguera-Mora, M.T.3
-
35
-
-
0000708517
-
Thermogravimetric Analysis of SiC Oxidation
-
Edited by K. E. Spear. Electrochemical Society, Inc., Pennington, NJ
-
C. E. Ramberg and W. L. Worrell, "Thermogravimetric Analysis of SiC Oxidation"; pp. 839-46 in Proceedings of the 9th International Conference on High Temperature Materials Chemistry, Vol. 97-39. Edited by K. E. Spear. Electrochemical Society, Inc., Pennington, NJ, 1997.
-
(1997)
Proceedings of the 9th International Conference on High Temperature Materials Chemistry
, vol.39-97
, pp. 839-846
-
-
Ramberg, C.E.1
Worrell, W.L.2
-
36
-
-
0023329856
-
Calculations of Parabolic Rate Constants
-
197
-
B. Pierragi, "Calculations of Parabolic Rate Constants," Oxid. Met., 27 [3/4] 177-85 (197).
-
Oxid. Met.
, vol.27
, Issue.3-4
, pp. 177-185
-
-
Pierragi, B.1
|