Contact resistance of focused ion beam deposited platinum and tungsten films to silicon

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2543-2546

  DeMarco, Anthony J ^a   Melngailis, John ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS; ELECTRON TUNNELING; ION IMPLANTATION; PLATINUM; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SINTERING; TUNGSTEN;

CONTACT RESISTANCE; METAL SEMICONDUCTOR TUNNELING CONTACT; TUNGSTEN SILICIDES;

ION BEAM ASSISTED DEPOSITION;

EID: 0035519814     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1410094     Document Type: Article

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