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Volumn 19, Issue 6, 2001, Pages 2617-2620
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Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al 2O3)1-x-y optical superlattices for attenuated phase shift mask in ArF lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINA;
BINDING ENERGY;
CHROMIUM COMPOUNDS;
MAGNETRON SPUTTERING;
MASKS;
PERMITTIVITY;
PHASE SHIFT;
PHOTOELECTRON SPECTROSCOPY;
SUPERLATTICES;
THICKNESS MEASUREMENT;
TUNING;
ZIRCONIA;
ARGON FLUORIDE LITHOGRAPHY;
CHROMIUM OXIDES;
PHASE SHIFT MASK;
PHOTOLITHOGRAPHY;
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EID: 0035519484
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1408951 Document Type: Article |
Times cited : (3)
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References (7)
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