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Volumn 19, Issue 6, 2001, Pages 2617-2620

Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al 2O3)1-x-y optical superlattices for attenuated phase shift mask in ArF lithography

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; BINDING ENERGY; CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; MASKS; PERMITTIVITY; PHASE SHIFT; PHOTOELECTRON SPECTROSCOPY; SUPERLATTICES; THICKNESS MEASUREMENT; TUNING; ZIRCONIA;

EID: 0035519484     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1408951     Document Type: Article
Times cited : (3)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.