In situ submicron patterning with silicon nitride evaporation masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2073-2076

  Purbach, U ^a,b   De Lozanne, A ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; EVAPORATION; PHOTOLITHOGRAPHY; SILICON NITRIDE; SURFACE ROUGHNESS; VACUUM APPLICATIONS; VAPOR PRESSURE;

EVAPORATION MASKS; IN SITU SUBMICRON PATTERNING; LOW PRESSURE CHEMICAL VAPOR DEPOSITION;

MASKS;

EID: 0035519456     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1412658     Document Type: Article

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