Ostwald ripening analysis using phase-field model

Materials Transactions

Volumn 42, Issue 11, 2001, Pages 2410-2414

  Ode, Machiko ^a   Suzuki, Toshio ^a   Kim, Seong Gyoon ^a   Kim, Won Tae ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Aluminum copper alloy; Ostwald ripening; Phase field model; Thin interface limit; Vanishing kinetic coefficient

Indexed keywords

AGGLOMERATION; ALUMINUM ALLOYS; APPROXIMATION THEORY; CRYSTAL SYMMETRY; MATHEMATICAL MODELS; PARTICLE SIZE ANALYSIS; PHASE INTERFACES; STATISTICAL METHODS; VOLUME FRACTION;

OSTWALD RIPENING; VANISHING KINETIC COEFFICIENTS;

BINARY ALLOYS;

EID: 0035519432     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.42.2410     Document Type: Article

References (18)