Recent tests of negative electron affinity photocathodes as source for electron lithography and microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2585-2590

  Arcuni, P ^a   Presley, S ^a   Aebi, V ^a   Spicer, W E ^b  

^a Intevac Inc   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRIC FIELD EFFECTS; ELECTRON BEAM LITHOGRAPHY; ELECTRON MICROSCOPY; ELECTRON TRAPS; LIGHTING; QUANTUM EFFICIENCY;

ELECTRON COLUMN; EMISSION CURRENT; FIELD EMISSION; TRANSVERSE ENERGY SPREADS;

PHOTOCATHODES;

EID: 0035519158     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1418416     Document Type: Article

References (11)

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3. A. W. Baum, Ph.D. thesis, Department of Applied Physics, Stanford University, 1997.
4. C. A. Sanford, Ph.D. thesis, Department of Electrical Engineering, Cornell University, 1990.
5. J. E. Schneider, Ph.D. thesis, Department of Applied Physics, Stanford University, 1998.
6. W. E. Spicer, Appl. Phys. 12, 115 (1977).
7. R. L. Bell, Negative Electron Affinity Devices (Clarendon, Oxford, 1973).
8. R. Alley et al., Nucl. Instrum. Methods Phys. Res. A 365, 1 (1995).
9. Intevac Photonics Technology Division, 3580 Bassett St., Santa Clara, CA 95054.
10. A. W. Baum, W. E. Spicer, R. F. W. Pease, K. A. Costello, and V. Aebi, Proc. SPIE 2522, 208 (1995).
11. P. W. Hawkes and E. Kasper, Principles of Electron Optics Vol. 2: Applied Geometrical Optics (Academic, San Diego, 1996), pp. 953-970.