Solid-gas reaction during sintering of Si3N4 ceramics (Part 7) Temperature dependence of mass loss of sintered Si3N4 ceramics during heat treatment

Journal of the Ceramic Society of Japan

Volumn 109, Issue 1275, 2001, Pages 960-962

  Hattori, Tomoya ^a   Wada, Shigetaka ^b   Yokoyama, Kazushige ^c  

^a Keyo Seiko Co   (Japan)

^b Rd Management Section   (Japan)

^c TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Mass loss; Si3N4; Si3N4 ceramics; Sintering; SiO(g); Temperature

Indexed keywords

DIFFUSION IN SOLIDS; HEAT TREATMENT; PARTIAL PRESSURE; REACTION KINETICS; SINTERING; TEMPERATURE; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ARRHENIUS PLOT; GAS PRESSURE SINTERING; MASS LOSS; SAGGER; SOLID-GAS REACTION;

SILICON NITRIDE;

EID: 0035518443     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.109.1275_960     Document Type: Article

References (13)

1. Sugutsukaeru Netsurikigaku
2. Kagaku Binran