New approach to isotropic texturing techniques on multicrystalline silicon wafers

Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 11, 2001, Pages 619-622

  Park, S W ^a   Kim, D S ^a   Lee, S H ^a  

^a Samsung SDI   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; ETCHING; MASKS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SPRAYING; SULFURIC ACID; TEXTURES;

ISOTROPIC TEXTURING TECHNIQUES;

SILICON WAFERS;

EID: 0035517622     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012824115191     Document Type: Article

References (7)