Interpretation of potential transients during aluminum etch tunnel growth in the presence of sulfuric acid

Electrochemistry

Volumn 69, Issue 11, 2001, Pages 843-847

  Choi, J ^a   Kwang Hee Lee, ^a   Tak, Y ^a  

^a Inha University   (South Korea)

Author keywords

Aluminum Etching; Current Interruption Method; Passivation; Potential Transients

Indexed keywords

EID: 0035517157     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.69.843     Document Type: Article

References (18)