Preferential resputtering phenomenon on the surface of (100)-oriented Ni-Pt films: Effect of substrate bias during sputter deposition

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2979-2981

  Shi, J ^a   Zhou, R ^a   Hashimoto, M ^a  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COERCIVE FORCE; COMPOSITION; EPITAXIAL GROWTH; ION BOMBARDMENT; LATTICE CONSTANTS; MAGNETIZATION; NICKEL ALLOYS; SINGLE CRYSTALS; SPUTTER DEPOSITION; TENSILE STRESS;

PREFERENTIAL RESPUTTERING;

THIN FILMS;

EID: 0035507987     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1407243     Document Type: Article

References (16)