Steady-state direct-current plasma immersion ion implantation using a multipolar magnetic field electron cyclotron resonance plasma source

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2889-2892

  Zeng, Xuchu ^a   Tong, Honghui ^a   Fu, Ricky King Yu ^a   Chu, Paul K ^a   Xu, Zejin ^b   Chen, Qingchuan ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; HYDROGEN; MAGNETIC FIELD EFFECTS; PLASMA SHEATHS; PLASMA SOURCES; SECONDARY ION MASS SPECTROMETRY; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

HYDROGEN FORWARD SCATTERING; PLASMA IMMERSION ION IMPLANTATION (PIII);

ION IMPLANTATION;

EID: 0035507912     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1412653     Document Type: Article

References (17)