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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2879-2883

Fabrication and characterization of C implantation standards for Si1-x-yGexCy alloys

(6) Laursen, T a Chandrasekhar, D a Hervig, R L a Mayer, J W a Smith, David J a Jasper, C b

a ARIZONA STATE UNIVERSITY (United States)

b MOTOROLA INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; HIGH RESOLUTION ELECTRON MICROSCOPY; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM; SENSITIVITY ANALYSIS;

RELATIVE SENSITIVITY FACTOR (RSF);

SILICON ALLOYS;

EID: 0035507473 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1412652 Document Type: Article

Times cited : (2)

References (19)

1
- 0027904746
- (1993) J. Cryst. Growth , vol.127 , pp. 425
- Powell, A.R.¹ Eberl, K.² Ek, B.A.³ Iyer, S.S.⁴

2
- 5844287660
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 1108
- Stein, B.L.¹ Yu, E.T.² Croke, E.T.³ Hunter, A.T.⁴ Laursen, T.⁵ Bair, A.E.⁶ Mayer, J.W.⁷ Ahn, C.C.⁸

3
- 0342687209
- (1996) Appl. Phys. Lett. , vol.69 , pp. 1734
- Lanzerotti, L.D.¹ Lourtioz, J.-M.² Julien, F.H.³ Warren, P.⁴ Dutoit, M.⁵

4
- 21544446451
- (1993) Appl. Phys. Lett. , vol.63 , pp. 2786
- Strane, J.W.¹ Stein, H.J.² Lee, S.R.³ Doyle, B.L.⁴ Picraux, S.T.⁵ Mayer, J.W.⁶

5
- 21544453381
- (1994) Appl. Phys. Lett. , vol.65 , pp. 2559
- Atzmon, Z.¹ Bair, A.E.² Jaquez, E.J.³ Mayer, J.W.⁴ Chandrasekhar, D.⁵ Smith, D.J.⁶ Hervig, R.L.⁷ Robinson, M.⁸

6
- 0001142463
- (1995) Appl. Phys. Lett. , vol.67 , pp. 1247
- Todd, M.¹ Matsunaga, P.² Kouvetakis, J.³ Chandrasekhar, D.⁴ Smith, D.J.⁵

7
- 0029305929
- (1995) J. Cryst. Growth , vol.150 , pp. 931
- Osten, H.J.¹ Dietrich, B.² Rücker, H.³ Methfessel, M.⁴

8
- 21544477594
- (1995) Appl. Phys. Lett. , vol.67 , pp. 259
- Mi, J.¹ Warren, P.² Letourneau, P.³ Judelewicz, M.⁴ Gailhanou, M.⁵ Dutoit, M.⁶ Dubois, C.⁷ Dupuy, J.C.⁸

9
- 0001010184
- (1996) J. Appl. Phys. , vol.80 , pp. 3043
- Liu, C.W.¹ Amour, A.St.² Sturm, J.C.³ Lacroix, Y.R.J.⁴ Thewalt, M.L.W.⁵ Mayer, C.W.⁶ Eaglesham, D.⁷

10
- 0000156860
- (1996) Appl. Phys. Lett. , vol.69 , pp. 1915
- Lu, X.¹ Cheung, N.W.²

11
- 0001213388
- (1997) J. Appl. Phys. , vol.81 , pp. 1700
- Im, S.¹ Song, J.H.² Lie, D.Y.C.³ Eisen, F.⁴ Atwater, H.⁵ Nicolet, M.-A.⁶

12
- 0031071169
- (1997) Thin Solid Films , vol.294 , pp. 129
- Guedj, C.¹ Pottier, X.² Haivie, A.³ Bouchier, D.⁴ Calvarin, G.⁵ Piriou, B.⁶

13
- 0031070224
- (1997) Thin Solid Films , vol.294 , pp. 105
- Croke, E.T.¹ Hunter, A.T.² Pettersson, P.O.³ McGill, T.C.⁴ Ahn, C.C.⁵

14
- 0031245789
- (1997) Thin Solid Films , vol.308-309 , pp. 358
- Laursen, T.¹ Chandrasekhar, D.² Smith, D.J.³ Mayer, J.W.⁴ Croke, E.T.⁵ Hunter, A.T.⁶

15
- 6944244312
- (1995) Nucl. Instrum. Methods Phys. Res. B , vol.103 , pp. 339
- Bair, A.E.¹ Atzmon, Z.² Russell, S.W.³ Alford, T.L.⁴ Mayer, J.W.⁵ Barbour, J.C.⁶

16
- 0018983137
- (1980) Anal. Chem. , vol.52 , pp. 277
- Leta, D.P.¹ Morrison, G.H.²

17
- 0003698310
- Wiley, New York
- (1989) Secondary Ion Mass Spectrometry
- Wilson, R.G.¹ Stevie, F.A.² Magee, C.W.³

18
- 0022075813
- (1985) Nucl. Instrum. Methods Phys. Res. B , vol.9 , pp. 344
- Doolittle, L.R.¹

19
- 0001672112
- (1997) Appl. Phys. Lett. , vol.71 , pp. 1634
- Laursen, T.¹ Chandrasekhar, D.² Smith, D.J.³ Mayer, J.W.⁴ Huffman, J.⁵ Westhoff, R.⁶ Robinson, M.⁷

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