Effect of current density on Al alloy microplasma oxidation

Journal of Materials Science and Technology

Volumn 17, Issue 6, 2001, Pages 657-660

  Xin, Shigang ^a   Jiang, Zhaohua ^a   Wang, Fuping ^a   Wu, Xiaohong ^a   Zhao, Liancheng ^a   Shimizu, Tadao ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC COATINGS; CURRENT DENSITY; OXIDATION; PLASMAS; TERNARY SYSTEMS;

ALUMINUM ALLOY MICROPLASMA OXIDATION; CURRENT DENSITY EFFECTS;

ALUMINUM ALLOYS;

EID: 0035502313     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)