The influence of crystallization route on the Bi4Ti3O12 thin films by chemical solution deposition technique

Materials Letters

Volumn 51, Issue 3, 2001, Pages 240-244

  Xiao, Zhuo Bing ^a   Wu, Xian Ming ^a   Wang, Hong ^b   Wang, Zhuo ^b   Shan, Shu Xia ^b   Wang, Min ^b  

^a JISHOU UNIVERSITY   (China)

^b SHANDONG UNIVERSITY   (China)

Author keywords

Chemical solution deposition; Dielectric constant; Thin film

Indexed keywords

BISMUTH COMPOUNDS; CRYSTALLIZATION; CURRENT DENSITY; ELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONOLAYERS; PERMITTIVITY; POLARIZATION;

CHEMICAL SOLUTION DEPOSITION (CSD);

THIN FILMS;

EID: 0035498599     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(01)00297-X     Document Type: Article

References (9)