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Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 10, 2001, Pages 569-574

TEM characterization of Co-Al-O nano-granular TMR film

(3) Kamei, K a Yonemura, M a Hanafusa, K a

a Sumitomo Metal Industries Limited (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; ELECTRON TUNNELING; FERROMAGNETIC MATERIALS; GIANT MAGNETORESISTANCE; GRAIN BOUNDARIES; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

TUNNELING MAGNETORESISTANCE (TMR) FILMS;

MAGNETIC THIN FILMS;

EID: 0035485571 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1012489503146 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.