Early history of vacuum arc deposition

IEEE Transactions on Plasma Science

Volumn 29, Issue 5 I, 2001, Pages 759-761

  Boxman, Raymond L ^a,b  

^a IEEE   (Israel)

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

Arthur W. Wright; Coatings; History; Thin films; Thomas A. Edison; Vacuum arc

Indexed keywords

CATHODE SHIELDING; MIRROR COATINGS; SEED LAYERS; SUBSTRATE MOTION; VACUUM ARC DEPOSITION;

CATHODES; COATINGS; DEPOSITION; ELECTRIC BREAKDOWN; ELECTRIC CURRENTS; HISTORY; MULTILAYERS; PLASMAS; THIN FILMS; VACUUM APPLICATIONS;

ELECTRIC ARCS;

EID: 0035485554     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.964470     Document Type: Article

References (14)

1. On the production of transparent metallic films by the electrical discharge in exhausted tubes
2. On a new process for the electrical deposition of metals and for constructing metal-covered glass specula
3. Evaporation from an electric arc in vacuum
4. Structures of the metal films produced by vacuum-arc evaporation method
5. Principles and applications of vacuum arc coatings
6. Vacuum-arc evaporations of ferrites and compositions of their deposits
7. Vacuum-arc coating technologies at NSC KIPT