Photoabsorption of synthetic silica glass under ArF excimer laser irradiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 10, 2001, Pages 5962-5965

  Shimbo, Masaru ^a   Nakajima, Toshio ^a   Tsuji, Naoki ^a   Kakuno, Tsutomu ^b   Obara, Takashi ^b  

^a Nissei Bldg   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

ArF excimer laser; OH concentration; Optical absorption; Silica glass; UV irradiation

Indexed keywords

COLOR; CURRENT DENSITY; DOSIMETRY; EXCIMER LASERS; FREQUENCIES; LASER BEAM EFFECTS; LIGHT ABSORPTION; LIGHT TRANSMISSION; OPTICAL VARIABLES MEASUREMENT; PHASE EQUILIBRIA; SILICA; ULTRAVIOLET RADIATION;

DISCOLORING REACTION; HEAVY DOSE REGION; HYDROXIDE CONCENTRATION; PHOTOABSORPTION; SYNTHETIC SILICA GLASS;

GLASS;

EID: 0035484413     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.5962     Document Type: Article

References (13)