Surface modification of a polymer film by cryogenic laser ablation of organosilicon compounds

Applied Physics A: Materials Science and Processing

Volumn 73, Issue 4, 2001, Pages 527-530

  Drinek, V ^a,b   Niino, H ^a   Pola, J ^b   Yabe, A ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; CRYOGENICS; EXCIMER LASERS; FILM PREPARATION; HYDROPHOBICITY; LASER ABLATION; PHOTOLYSIS; POLYMERIZATION; SILICON COMPOUNDS; SURFACE STRUCTURE; SURFACE TREATMENT; THERMAL EFFECTS;

CRYOGENIC LASER ABLATION; FROZEN FILM; HEXAMETHYLCYCLOTRISILAZANE;

PLASTIC FILMS;

EID: 0035476281     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390100925     Document Type: Article

References (17)