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Volumn 41, Issue 9-10, 2001, Pages 1427-1431

Electric passivation of interface traps at drain junction space charge region in p-MOS transistors

Author keywords

[No Author keywords available]

Indexed keywords

HOT CARRIERS; HYDROGEN; PASSIVATION; SEMICONDUCTING SILICON; SEMICONDUCTOR JUNCTIONS;

EID: 0035456809     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(01)00172-X     Document Type: Article
Times cited : (9)

References (8)
  • 4
    • 0032098772 scopus 로고    scopus 로고
    • Reduction of interface traps in p-channel MOS transistors during channel-hot-hole stress
    • Han KM, Sah CT. Reduction of interface traps in p-channel MOS transistors during channel-hot-hole stress. IEEE Trans Electron Dev 1998; 45:1380.
    • (1998) IEEE Trans Electron Dev , vol.45 , pp. 1380
    • Han, K.M.1    Sah, C.T.2
  • 6
    • 0033889077 scopus 로고    scopus 로고
    • Interfacial electronic traps in surface controlled transistors
    • Cai J, Sah C T. Interfacial electronic traps in surface controlled transistors. IEEE Tran Electronic Dev 2000;47:576.
    • (2000) IEEE Tran Electronic Dev , vol.47 , pp. 576
    • Cai, J.1    Sah, C.T.2
  • 8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.