Influence of pulse bias voltage on microstructure and properties of TiN films deposited by vacuum arc

Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment

Volumn 22, Issue 3, 2001, Pages 62-

  Zeng, P ^a   Hu, S J ^a   Xie, G R ^a   Huang, N C ^a   Wu, Q B ^a  

^a NONE

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EID: 0035456157     PISSN: 10096264     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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