120-nm lithography using off-axis TIR holography and 364 nm exposure wavelength

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 59-63

  Barge, M ^a   Bruynooghe, S ^a   Clube, F ^a   Nobari, A ^a   Saussol, J L ^a   Grass, E ^b   Mayer, H ^b   Schnabel, B ^c,d   Kley, E B ^c  

^a Holtronic Technologies   (Switzerland)

^b Microfab AG   (Liechtenstein)

^c FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^d Vistec Electron Beam GmbH   (Germany)

Author keywords

DFB lasers; Holography; Lithography; SAW filters

Indexed keywords

DIFFRACTION GRATINGS; DISTRIBUTED FEEDBACK LASERS; ELECTRON HOLOGRAPHY; LASER BEAMS; OPTICAL RESOLVING POWER; REFLECTION; SUBSTRATES; ULTRAFILTRATION;

TOTAL INTERNAL REFLECTION (TIR) HOLOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0035450339     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00430-0     Document Type: Article

References (3)

1. Holographic microlithography
2. Holography with total internally reflected light