Alignment optimization for critical DUV lithography

Semiconductor International

Volumn 24, Issue 10, 2001, Pages 79-86

  Putnam, C ^a   Tyminski, J K ^a   Battersen, R ^a   Gallo, A ^a  

^a NIKON PRECISION INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MEASUREMENT ERRORS; MEASUREMENT THEORY; MONOLITHIC INTEGRATED CIRCUITS; OPTIMIZATION; SPECIFICATIONS; VECTORS; WSI CIRCUITS;

NON-LINEAR ERRORS (NLE);

PHOTOLITHOGRAPHY;

EID: 0035446684     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (0)