|
Volumn 11, Issue 5, 2001, Pages 603-611
|
Resolution enhanced proximity printing by phase and amplitude modulating masks
|
Author keywords
[No Author keywords available]
|
Indexed keywords
AMPLITUDE MODULATION;
COMPUTER SIMULATION;
ELECTRON BEAM LITHOGRAPHY;
LIGHT MODULATION;
LIGHT TRANSMISSION;
MASKS;
OPTICAL DESIGN;
PHASE MODULATION;
AMPLITUDE TRANSMISSION;
BINARY AMPLITUDE;
ILLUMINATION WAVE;
MODULATING MASKS;
PHOTOMASK;
PROXIMITY PRINTING;
WAVE OPTICAL EFFECTS;
PHOTOLITHOGRAPHY;
|
EID: 0035442590
PISSN: 09601317
EISSN: None
Source Type: Journal
DOI: 10.1088/0960-1317/11/5/325 Document Type: Article |
Times cited : (12)
|
References (12)
|