Chromium Oxycarbide Thin Films Prepared by Inductively Coupled Radio-Frequency Plasma-Assisted Magnetron Sputtering

Journal of the American Ceramic Society

Volumn 84, Issue 8, 2001, Pages 1763-1766

  Kado, Tetsuo ^a   Fan, Qiulin ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; CORROSION RESISTANCE; GLOW DISCHARGES; MAGNETRON SPUTTERING; MICROHARDNESS; STAINLESS STEEL; TEMPERATURE; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CHROMIUM OXYCARBIDE THIN FILMS; FILM STRUCTURE; VICKERS MICROHARDNESS;

CERAMIC MATERIALS;

EID: 0035437575     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00912.x     Document Type: Article

References (10)

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